Bismuth (Bi) Sputtering Targets

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Bismuth (Bi) Sputtering Targets

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Description:

Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Because of our unique technology and development, SMC can assure consistent and high availability of sputtering targets that meet our customers requirements. We are able to produce targets of rare or less frequently used compositions as well as a wide array of standard items at competitive prices.

Specifications:

Purity >99.99%
Shape Disc Targets, Plate Targets, Column Targets, Step Targets, Custom-made
Size Circular: Diameter < 14inch, Thickness > 1mm; Block: Length < 32inch, Width < 12inch, Thickness > 1mm


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